文献类型：期刊文献

中文题名：极紫外光刻中动态气体锁污染物防控的研究进展

英文题名：Research Progress of Dynamic Gas Lock for Pollutant Prevention and Control in Extreme Ultraviolet Lithography Process

作者：王晓伟[1,2];张志军[2];尹凝霞[1];张静[1];张世伟[2]

机构：[1]广东海洋大学机械工程学院,广东湛江524088;[2]东北大学机械工程与自动化学院,辽宁沈阳110819

年份：2025

期号：21

起止页码：6

中文期刊名：光学学报(网络版)

外文期刊名：Acta Optica Sinica(Online)

基金：国家自然科学基金(U20A20292);中国科学院环境光学与技术重点实验室项目(2005DP173065-2022-02);广东海洋大学科研启动经费资助项目(060302062319)

语种：中文

中文关键词：极紫外光刻;动态气体锁;稀薄气体流动;污染物抑制;结构优化

外文关键词：extreme ultraviolet lithography;dynamic gas lock;rarefied gas flow;pollutant inhibition;structure optimization

中文摘要：动态气体锁(DGL)不仅允许极紫外(EUV)光在各个腔室之间传输,还能防止污染物从污染腔扩散到清洁腔,是EUV光刻机中污染物控制的重要部件之一。本文通过调研国内外在DGL技术上的研究进展,综述了DGL抑制效能的评估方法、DGL抑制效能的影响因素及其变化规律、DGL结构改进方案。从抑制效能表征方法、抑制效能强化机制和抑制效能高效模拟方面对DGL技术的研究前景进行了展望。

外文摘要：The dynamic gas lock(DGL)serves as a critical component for contamination control in extreme ultraviolet(EUV)lithography systems.It not only enables the transmission of EUV light between chambers but also effectively prevents the transfer of contaminants from contaminated chambers to clean ones.This paper reviews recent research progress in DGL technology,both domestically and internationally,summarizing evaluation methods for DGL suppression efficiency,key influencing factors and their variation patterns,as well as structural optimization strategies.Future research directions are also discussed,including advanced characterization techniques,enhancement mechanisms for suppression performance,and efficient simulation approaches for DGL efficiency.